(March 15) Pulsed-laser crystallization of Si films for TFTs: current status and future opportunities

  • Subject
    Pulsed-laser crystallization of Si films for TFTs: current status and future opportunities
  • Date
    16:30, Tuesday, March 15, 2016
  • Speaker
    Prof. James S. Im(Columbia Univ.)
  • Place
    KAIST KI Building Lecture Room B401
Overview: 

Pulsed-laser crystallization of Si films on glass substrates has become an essential, substantial, and growing technology for realizing high-performance TFTs that enable the manufacture of advanced LCDs and OLED displays. In addition to these increasingly sophisticated flat-panel displays, the approach can also potentially provide a variety of high-quality Si films for 3D microelectronics, photovoltaic devices, and other large-area-electronic products. In this presentation, the field’s current status and future challenges/opportunities as regards both fundamental understanding and technological capabilities will be discussed. In particular, I will present an idea about the possibility of using a new type of advanced lasers (in the form of high-power, quasi-CW, UV, fiber lasers) for advancing the field into attaining the next level of technical and operational capabilities.

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