Reasearch on the fabrication of memristor-based fabric non-volatile logic computing circuits by Ph.D candidate Bae, Hak-Yeol(Prof. Choi, Yang-Gyu) and Ph.D candidate Jang, Byung-cheol (Prof. Choi, Seong-Yool) has been published in Nano Letters.
Fabric type memristor devices were fabricated by coating tens of nano metal layers and insulating film layers on the yarn making clothes, and lattice.
This fabric type memristor device has excellent flexibility and overcomes the limitation of conventional von Neumann computing method in order to minimize battery consumption of wearable electronic device. It makes static power consumption close to 0 W, so it is expected that the application value is high as a wearable element.
– Journal : Nano Letters
– Title : Functional Circuitry on Commercial Fabric via Textile-Compatible Nanoscale Film Coating Process for Fibertronics
– Authors : Ph.D candidate Bae, Hak-Yeol(Prof. Choi, Yang-Gyu), Ph.D candidate Jang, Byung-cheol (Prof. Choi, Seong-Yool)